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product Introduction This power supply integrated ion accelerating and thin film material heating dual function, is suitable for the group ion beam plating and arc ion plating, DC sputtering coating, DC bias sputtering…Read more ADD TO INQUIRY
product Introduction This power supply is a 20 kw output power current source, suitable for plasma surface treatment, plasma heating, plasma sintering, plasma body heat treatment, plasma body heat processing, plasma synthesis, chemical…Read more ADD TO INQUIRY
product Introduction Grid bias magnetron sputtering power supply is a 40kW power current source which is to connect the device with power grids. This power supply is suitable for plasma surface treatment, plasma…Read more ADD TO INQUIRY
product Introduction Medium frequency magnetron sputtering power supply is a power current source which is to connect the device with power grids. This power supply is suitable for plasma surface treatment, plasma heating,…Read more ADD TO INQUIRY
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